Sic Long Crystal Furnace is suitable for 6-inch or 8-inch SIC substrate growth, medium frequency induction or resistance heating system, process gas quick adjustment system, and under-loading structure, it can realize convenient start-up and maintenance operation, at the same time, the equipment has high-precision temperature control, pressure control ability, process performance is stable and excellent.
Epitaxial single cavity/multiple pieces (Max. 3×8Inch) + clean vacuum manipulator handling。
?Each disk has independent temperature control and high temperature control precision;
?Horizontal layer flow gas + molecular pump exhaust, control gas distribution uniform;
?Process real-time monitoring, accurate control parameters;
Precision optical electron gun evaporation system is specially designed for the coating of precision optical thin film devices, and the design and overall structure of each system meet the requirements of optical thin film production process